Publication - Journal Article 157 nm Pellicles (Thin Films) for Photolithography:  Mechanistic Investigation of the VUV and UV-C Photolysis of Fluorocarbons

Journal of the American Chemical Society, vol. 127, iss. 23, pp. 8320-8327, 2005

Kwangjoo Lee, Steffen Jockusch, Nicholas J. Turro, Roger H. French, Robert C. Wheland, M. F. Lemon, Andre M. Braun, Tatjana Widerschpan, David A. Dixon, Jun Li, Marius Ivan, Paul Zimmerman