Publication - Journal Article Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 28, iss. 5, pp. 1060-1072, 2010

D. R. Baer, M. H. Engelhard, A. S. Lea, P. Nachimuthu, T. C. Droubay, J. Kim, B. Lee, C. Mathews, R. L. Opila, L. V. Saraf, W. F. Stickle, R. M. Wallace, B. S. Wright