Publication - Journal Article Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

Journal of the American Society for Mass Spectrometry, vol. 26, iss. 8, pp. 1283-1290, 2015

Zhaoying Wang, Bingwen Liu, Evan W. Zhao, Ke Jin, Yingge Du, James J. Neeway, Joseph V. Ryan, Dehong Hu, Kelvin H. L. Zhang, Mina Hong, Solenne Le Guernic, Suntharampilai Thevuthasan, Fuyi Wang, Zihua Zhu