Design and performance of a high-flux electrospray ionization source for ion soft landing

Journal Article
The Analyst, vol. 140, iss. 9, pp. 2957-2963, 2015
Authors
K. Don D. Gunaratne, Venkateshkumar Prabhakaran, Yehia M. Ibrahim, Randolph V. Norheim, Grant E. Johnson, Julia Laskin
Abstract

A high-flux electrospray source enables deposition of micrograms of mass-selected ions for studies in catalysis and materials science.

English