Publication - Journal Article Inhibition of AlF₃·3H₂O Impurity Formation in Ti₃C₂T_x MXene Synthesis under a Unique CoF_x/HCl Etching Environment

Journal Article

ACS Applied Energy Materials, vol. 2, iss. 11, pp. 8145-8152, 2019

Authors

Cody B. Cockreham, Xianghui Zhang, Houqian Li, Ellis Hammond-Pereira, Junming Sun, Steven R. Saunders, Yong Wang, Hongwu Xu, Di Wu

Language English

Publication - Journal Article Inhibition of AlF3·3H2O Impurity Formation in Ti3C2Tx MXene Synthesis under a Unique CoFx/HCl Etching Environment